Crystal Research and Technology : Journal of Experimental and Industrial Crystallography / Zeitschrift für experimentelle und technische Kristallographie. Volume 23, Number 5, May / hrsg. von H. Neels.
Material type:
- 9783112485453
- 9783112485460
- online - DeGruyter
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Biblioteca "Angelicum" Pont. Univ. S.Tommaso d'Aquino Nuvola online | online - DeGruyter (Browse shelf(Opens below)) | Online access | Not for loan (Accesso limitato) | Accesso per gli utenti autorizzati / Access for authorized users | (dgr)9783112485460 |
Frontmatter -- Directions to the author -- Original Papers -- On the Morphological Instability of Growing Crystals (I) Morphological Peculiarities of the Transition Shapes of Crystals in Diffusioncontrolled Regime of Growth -- Polymorphic Transitions of Ice at a Pressure up to 2500 MPa in the Temperature Range 90—300 K -- High Pressure Phase Transformation in MnS -- Fluctuation Theory of the One-component and Binary Metallic Melt's Crystallization in the Case of Micro- and Macro-Systems -- Crystallization Kinetics of Lithium Niobate Films from Limited Volume of Melt Solution -- Inference of System Configurations on Thickness Homogeneity and Lateral Dopant Distribution of MBE Grown Films -- Metalorganic Chemical Vapour Deposition of Oriented ZnO Films -- Bridgman-Stockbarger Growth and Spectral Characteristics of Al2O3: Ti3+ Single Crystals -- Structure Refinement of Paranatrolite by X-ray Diffraction -- TC Anisotropy and Texture of Fine Niobium Wire and Foil -- Investigation on Synthesis, Characterization, and Electronic Behaviour of Zinc Oxide Thin Films in Relation to Fabrication of Oxygen Gas Sensor -- Infrared Optical Characterization of (Cu2GeSe3)1-x(CuGe2P3)x Mixed Crystals -- Interference Pattern of X-ray Waves inside the Crystal and its Image in Vacuum in Double-Field Approximation (I) -- Structural Energetics of the Intermetallic Compounds CaMg2 and CaAl2 -- Radial Distortions of the Fermi Surfaces of Rubidium and Cesium -- Characterization of Plasma Etching of Molybdenum Polycid Conductor Stacks in Cl2/CF4 and Cl2/CF4/O2 -- The K3[Fe(CN)6]-K0H-H2 O Photoetchant for InP -- A Suplementary Consideration of Lateral Autodoping -- Etch Pit Morphology in CdTe -- Backmatter
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In German.
Description based on online resource; title from PDF title page (publisher's Web site, viewed 31. Jan 2022)